A structure zone diagram including plasma-based deposition and ion etching
نویسندگان
چکیده
منابع مشابه
Plasma-based ion implantation and deposition:
After pioneering work in the 1980s, plasma-based ion implantation (PBII) and plasma-based ion implantation and deposition (PBIID) can now be considered mature technologies for surface modification and thin film deposition. This review starts by looking at the historical development and recalling the basic ideas of PBII. Advantages and disadvantages are compared to conventional ion beam implanta...
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The reactive ion etching ofInP, InGaAs, and InAIAs in CClzF2/02 or C2R(/H2 discharges was investigated as a function of the plasma parameters pressure, power density, flow rate, and relative composition. The etch rates of these materials are a factor of 3-5 X faster in CC12F 2/0 2 (-600--1000 AminJ ) compared to CzHJH2 (160-320 AminI ). Significantly smoother morphologies are obtained with C2H6...
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Background: In this study we have prepared the IgA solution from normal human plasma using plasma fractionation and ion exchange chromatography. Materials and Methods: Using fractionation of plasma with cold ethanol (starting with 8% ethanol), fraction III was prepared as a suitable source for IgA preparation. Then it was treated with caprylic acid for separation of impurities. For enrichm...
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ژورنال
عنوان ژورنال: Thin Solid Films
سال: 2010
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2009.10.145